METHOD FOR MANUFACTURE FOR LIGHT SWITCHING OF SEMICONDUCTOR

摘要

The present invention provides a method of making a self-aligned semiconductor optical switch using variation of refractivity of optical waveguide by current application. This method includes the steps of: forming on a substrate (1) a light waveguide layer (2), an n-type InP clad layer (3), a p-type InP blocking layer (4) for blocking current, and an n-type InGaAs cap layer (5); selectively etching the cap layer (5) forming a reflecting surface to be in a groove shape and diffusing Zn all over the surface; depositing a p-type electrode (6) on the cap layer (5); and etching the cap layer (5), the p-type InP blocking layer (4), the clad layer (3), and depositing an n-type electrode (7) under the substrate (1).