发明名称 FLAME ATOMIC ABSORPTION PHOTOMETER AND FLAME ATOMIC ABSORPTION ANALYTICAL METHOD
摘要 PROBLEM TO BE SOLVED: To provide a flame atomic absorption photometer and a flame atomic absorption analytical method in which a target element of higher concentration can be measured precisely even when a background correction by utilizing the Zeeman effect is performed by applying a magnetic field to a sample. SOLUTION: A flat boardlike flame 2 is formed at a burner head 1 by a gas from a burner chamber 8. A permanent magnet 6 is installed in such a way that an S-pole 6a, an N-pole 6b and the flame 2 are faced in parallel by sandwiching both faces of the flame 2, and a rectlinear passage 7 which passes both poles is formed in the permanent magnet 6. The axis of the passage 7 is crossed with the face of the flat boardlike flame 2 at an angleθ. In addition, a rotation mechanism 6A which turns the permanent magnet 6, the burner head 1 and the burner chamber 8 inside a horizontal plane is installed. Analysis light 3s from a light source 3 is introduced into the passage 7, it is passed through the flat boardlike flame 2, it is passed through a spectroscope 4, and it is incident on a detector 5.
申请公布号 JPH0972846(A) 申请公布日期 1997.03.18
申请号 JP19950228939 申请日期 1995.09.06
申请人 HITACHI LTD 发明人 HIRANO YOSHIHIRO;KUROISHI TADAFUMI
分类号 G01N21/31;(IPC1-7):G01N21/31 主分类号 G01N21/31
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