发明名称 THIN FILM ELEMENT ARRAY AND MANUFACTURE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To prevent the deterioration in quality of picture due to the deterioration of contrast by a method wherein a coating film is formed on a metallic wiring which serves combinedly also as a light shielding film formed on the side of an array. SOLUTION: A gate wiring and an accumulation capacitor wiring 3 are formed on a glass substrate 1. Then, the gate wiring and the accumulation capacitor wiring 3 are anodized by the electrolyte such as oxalic acid etc., and a brown gate wiring coating film, which performs additional functions as an interlayer insulation and reflection attenuation, and an accumulation capacitor wiring coating 3a are formed on the accumulation capacitor wiring 3. The reflectivity to the visible light of the gate wiring and the accumulation capacitor wiring is set so that it becomes 6% or less. Then, an insulating film 10, a channel protective film and a semiconductor layer are formed. Besides, a source electrode 7, a picture element electrode 6 and a drain wiring etc., are formed.</p>
申请公布号 JPH0974203(A) 申请公布日期 1997.03.18
申请号 JP19950228905 申请日期 1995.09.06
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HIROSE TAKASHI;TSUBOI NOBUYUKI;TAMURA TATSUHIKO
分类号 G02F1/1333;G02F1/1343;G02F1/136;G02F1/1368;H01L21/316;H01L29/786;(IPC1-7):H01L29/786;G02F1/133;G02F1/134 主分类号 G02F1/1333
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