Positive working photosensitive composition and method of producing relief structures

摘要

Positive-working radiation-sensitive mixt. is based on (a) polymer(s) contg. acid-labile gps., which are insol. in water and rendered soluble in aq. alkaline soln. by acid; (b) organic photo-acid(s); and (c) other organic cpd(s)., in which (a) comprises 35-70 mole-% 4-hydroxystyrene units (I), 30-50 mole-% 4-tetrahydropyran-2-yloxystyrene units (II) and 0-15 mole-% 4-vinylcyclohexanol units (III); (b) is 2-methyl-4-hydroxy-5-isopropyl-phenyl-dimethylsulphonium triflate (IV); and (c) is an organic ammonium deriv. (V) of (IV) or an analogue. In the formulae, R', R", R'" = 1-4 C alkyl; or R', R" = CH2 gps. linked to a 5-membered ring.