PRODUCTION OF HIGH PURITY RADIATION-SENSITIVE COMPOSITION,申请号JP19950223957-传众专利搜索

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发明名称	PRODUCTION OF HIGH PURITY RADIATION-SENSITIVE COMPOSITION
摘要
申请公布号	JPH0968797(A)	申请公布日期	1997.03.11
申请号	JP19950223957	申请日期	1995.08.31
申请人	MITSUBISHI CHEM CORP	发明人	NISHI MINEO
分类号	G03F7/023;C08L61/04;C08L61/06;C08L101/00;G03F7/004;G03F7/022;H01L21/027;(IPC1-7):G03F7/023	主分类号	G03F7/023
代理机构		代理人
主权项
地址

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