| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate rotary type developing device which can reduce an irregularity in the developing reaction of a photoresist film even in the case where the photoresist film, which corresponds to the surface of a substrate in a high contrast and has a hydrophobic nature, is formed on the surface of the substrate. SOLUTION: In a substrate rotary type developing device which sucks and holds the rear of a substrate W on a holding surface 1a on the upper surface of a sunction spin-chuck 1, rotates the spin-chuck 1 around the vertical axis and this substrate W around the center of prescribed rotation, and piles up a developer fed to the surface of this substrate W to develop a photoresist film formed on the surface of the substrate W, the holding surface 1a on the upper surface of the spic-chuck 1 is formed into a recessed form.</p> |
