| 摘要 |
An ion implant characterization system (10) includes a pulsed pump beam source (12) and a probe beam source (14) which are all operated by a controller (16). A plurality of mirrors (18, 20), and (22, 24) may be employed for directing the pump and probe pulses (12a and 14a) respectively to a focusing optical element shown as a lens (26). Lens (26) provides a focussed pulsed beam (28) to a surface (30a) of an ion implanted sample (30) that is being characterized. A beamblocker (32) is employed to stop any reflected portion (32a) of the pump beam while a photodetector (34) is employed to receive the reflected portion of the pulsed probe beam, the portion of the probe beam that reflects from the surface (30a) of the sample (30).
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