CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To obtain a positive resist compsn. capable of forming a satisfactory resist not lowering the sensitivity with time after exposure or causing problem such as the formation of a T-shaped top or the reduction of line width. SOLUTION: This compsn. contains a compd. having at least one of tert. alkyl ester and tert. alkyl carbonate groups, a compd. having at least one of acetal and silyl ether groups, a compd. which generates an acid when irradiated with active light or radiation and an org. basic compd. The solubility of each of the former two compds. in an aq. alkali soln. is increased by the action of the generated acid.