| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive radiation sensitive composition high in transmissivity to far ultraviolet ray, electron beam and KrF eximer laser beam and showing high sensitivity at the time of being exposed by containing a specific copolymer and a specific dissolution preventing agent. SOLUTION: This radiation sensitive composition contains the copolymer expressed by formula I, the dissolution preventing agent expressed by formula II, a photosensitive material capable of generating an acid by being exposed to the radioactive ray irradiation and a solvent. In the formulas, R<1> expresses hydrogen atom of a methyl group. Each of R<2> and R<3> expresses an alkyl group or an aryl group. R<4> expresses an alkylene group or an alkynylene group. R<5> expresses an alkyl group or a cycloalkyl group. Ar expresses a phenylene group or a cyclohexylene group. X expresses -SO2 - group or -CO- group. Y expresses -OCOgroup or -CO- group. Each of (m), (n) and (p) expressed integers of >=1. |
