发明名称 Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system
摘要 A high-quality lens system (PL) is described, which system is rinsed with a gas having a low refractive index so as to reduce the influence of variations of ambient parameters on the optical behaviour. By adding a very small quantity of ozone to this gas, it is prevented that any deposit will be produced on the lens elements within the lens holder (PLH) as a result of decomposition of organic particles caused by UV radiation and precipitation of the decomposition products.
申请公布号 US5602683(A) 申请公布日期 1997.02.11
申请号 US19940361082 申请日期 1994.12.21
申请人 ASM LITHOGRAPHY 发明人 STRAAIJER, ALEXANDER;MARTENS, JAN W. D.
分类号 G02B7/02;G02B27/00;G03F7/20;H01L21/027;(IPC1-7):G02B7/02 主分类号 G02B7/02
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