发明名称 |
Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system |
摘要 |
A high-quality lens system (PL) is described, which system is rinsed with a gas having a low refractive index so as to reduce the influence of variations of ambient parameters on the optical behaviour. By adding a very small quantity of ozone to this gas, it is prevented that any deposit will be produced on the lens elements within the lens holder (PLH) as a result of decomposition of organic particles caused by UV radiation and precipitation of the decomposition products.
|
申请公布号 |
US5602683(A) |
申请公布日期 |
1997.02.11 |
申请号 |
US19940361082 |
申请日期 |
1994.12.21 |
申请人 |
ASM LITHOGRAPHY |
发明人 |
STRAAIJER, ALEXANDER;MARTENS, JAN W. D. |
分类号 |
G02B7/02;G02B27/00;G03F7/20;H01L21/027;(IPC1-7):G02B7/02 |
主分类号 |
G02B7/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|