| 摘要 |
An exposure apparatus for transferring a pattern of a mask onto a substrate, includes a regulating an member for regulating exposure beam from a light source, and an alignment optical system for projecting an alignment beam to an alignment mark of the mask, to perform alignment between the mask and the substrate. The regulating member is arranged to pass the alignment light therethrough. The distance E from the regulating member to the mask satisfies the relationE>/=(f+m)/2(tan theta +tan gamma ,)where, as viewed from a direction of formation of an edge of the regulating member, theta is the angle defined between an optical axis of the alignment beam and an optical axis of the exposure beam, f is the beam width of a portion of the alignment beam passing through the regulating member, gamma is the maximum of a divergence angle, in an exposure region, of the exposure beam, and m is the width of the alignment mark.
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