| 摘要 |
<p>An apparatus and method for wafer rotation in microelectronics manufacturing equipment is presented. The present invention combines an external stator assembly (29) having a plurality of electromagnetic actuator coils (27) with an internal rotor assembly (24) having a plurality of multipolar permanent magnets or ferromagnetic coupling tabs (26). The rotor assembly (24) supports the semiconductor wafer or any other substrate (30) inside the process chamber. The electromagnetic actuator coils (27) of the stator assembly (29) receive a plurality of multi-phase, controlled frequency electrical currents to create magnetic fields around the actuator coils (27) that interact with the multipolar permanent magnets or ferromagnetic coupling tabs (26) of the rotor assembly (24) to provide the rotational force to rotate the rotor assembly and thus, rotate the semiconductor wafer or any other substrate (30) within the process chamber.</p> |
