| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive material which is protected from intense UV rays, radiation or high humidity to give dimensional stability, prevents color contamination or deterioration and realizes a stable image by applying a polysilazane of a specified thickness range on a supporting body, heat treating the supporting body, and forming an adhesive layer and an antistatic layer. SOLUTION: A polysilazane is applied to 10nm to 10cm thickness on a supporting body and is subjected to heat treatment, on which an adhesive layer and an antistatic layer are formed. The polysilazane is a high mol.wt. compd. having a structure of Si atoms, nitrogen atoms and hydrogen atoms. This compd. is dispersed as a particle state of 1 to 100μm particle size in water or a water- soluble org. solvent such as alcohol, or the compd. is dissolved in an org. solvent such as methylethylketone, toluene, benzene, dioxane, dioxolane, xylene, and ethylcellusolve, and then used. After the polysilazane is applied and dried at 10-90 deg.C to vaporize the water or the org. solvent, the layer is heat treated at 20-500 deg.C.
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