| 摘要 |
<p>A novel, low friction coefft., chemically stable, complex thin film, based on carbon, silicon and hydrogen, contains 30 wt.% hydrogen and has C : Si atomic ratio 1.4-3.3, pref. 2.4-2.5. Also claimed is a very low friction coefft. pt. having a substrate consisting of a material unaffected by heating at 500-600 [deg]C and which has surface coating of the above complex thin film, pref. with an intermediate nitrided, carburised or carbonitrided layer between the substrate and the surface coating. Further claimed is a process for coating a substrate with the complex thin film by microwave plasma-enhanced CVD.</p> |
