| 摘要 |
PCT No. PCT/DE93/00047 Sec. 371 Date Aug. 30, 1994 Sec. 102(e) Date Aug. 30, 1994 PCT Filed Jan. 21, 1993 PCT Pub. No. WO93/20257 PCT Pub. Date Oct. 14, 1993Composite body consisting of a hard metal, steel, ceramic, particularly sintered ceramic or cermet substrate body or a substrate body made of diamond or a nickel or cobalt-based alloy and of one or more surface layers, of which at least one, preferably the outer layer, consists of Al2O3 with a fine crystalline structure, which has been applied by means of a plasma CVD process at substrate temperatures of 400 DEG C. to 750 DEG , preferably 450 DEG C. to 550 DEG , with a substrate body connected as cathode and with a plasma activation produced with a pulsed direct voltage.
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