| 摘要 |
Disclosed is a semiconductor device comprising a silicon substrate, a pad provided on the substrate and an integrated circuit portion provided in the substrate. The pad and the integrated circuit portion are electrically connected together by a first wiring layer. The pad and the substrate are electrically connected together by a second wiring layer. The second wiring layer includes a fuse portion. The first wiring layer is always grounded via the fuse portion while processing the device.
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