| 摘要 |
PURPOSE: To obtain a compsn. excellent in alkali developability, that is, easy to develop with an aq. alkali soln., having satisfactory sensitivity to active energy beams and giving a clear image when used as a resist material, etc., forming a nontacky coating film and excellent in alkali and chemical resistances of a resin after curing. CONSTITUTION: This compsn. contains a block copolymer consisting of hydrophilic segments (I) each having an acid group such as a carboxyl group and hydrophobic segments (II) formed from (meth)acrylic ester, etc., a polymerizable monomer and a polymn. initiator. The glass transition temp. (Tg) of the segments I in the block copolymer is >=-5 deg.C and that of the segments I or II' is <=80 deg.C. |
