发明名称 |
Integrated sensor for scanning probe microscope |
摘要 |
A piezoresistive layer extends in the middle of a cantilever extending from a support section. The cantilever is made of n type silicon and is covered with a silicon oxide film. Electrodes are connected to the both ends of the piezoresistive layer. A p type silicon region is formed at the free end of the cantilever, and includes a sharply pointed portion to provide a probe. An electrode is connected to a p+ type silicon region formed in the p type silicon region, and an electrode is connected to an n+ type silicon region formed in a position more than 10 mu m apart from the p type silicon region. A rectangular through hole is formed in the cantilever between the piezoresistive layer and the probe.
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申请公布号 |
US5583286(A) |
申请公布日期 |
1996.12.10 |
申请号 |
US19950514670 |
申请日期 |
1995.08.14 |
申请人 |
OLYMPUS OPTICAL CO., LTD. |
发明人 |
MATSUYAMA, KATSUHIRO |
分类号 |
G01B7/16;G01B7/34;G01B21/30;G01N37/00;G01Q20/04;G01Q60/06;G01Q60/22;G01Q60/38;G01Q70/04;G01Q70/08;H01J37/28;(IPC1-7):G01B7/34 |
主分类号 |
G01B7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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