| 摘要 |
PURPOSE: To obtain a new compound suitable as a component for the subject resist material with high resolution suitable to fine processing technique. CONSTITUTION: This new compound has at least one dioxyphenyl group protected by cyclic acetal, hemiacetal or ketal and is expressed by formula I [R<1> is H, an alkyl, alkoxyl or dialkylamino; R<2> and R<3> are each H or an alkyl, or may be partially mutually linked into a cycle; Y is a (substituted) alkyl or arylsulfonate; (n) is 0-2; (m) is 1-3; (n+m)=3]. The compound of formula I is obtained by reaction between a diaryl sulfoxide of formula II and a trialkylsilyl-sulfonate of the formula (R<5> )3 SiY (R<5> is an alkyl) followed by reaction of the resultant product with a Grignard reagent of formula III (X is a halogen). |
