发明名称 HEAT TREATING DEVICE
摘要 PURPOSE: To suppress the generation of particles by contact of through-holes disposed on a stage with supporting pins and to improve a yield by making heating temp. uniform. CONSTITUTION: A hot plate 22 on which an LCD substrate G is placed is provided with the through-holes 28 to be loosely fitted with the supporting pins 30. The supporting pins 30 are erected horizontally movably with respect to the holding members 31 of the supporting pins 30. Either of the opposite surfaces of a cover member 24 which is arranged to form a treating space between this member and the hot plate 22 and has a discharge port 25 and a shutter member 27 which openably and closably shuts off this treating space 23 is provided with a projection 50 for setting the spacing.
申请公布号 JPH08313855(A) 申请公布日期 1996.11.29
申请号 JP19950138740 申请日期 1995.05.12
申请人 TOKYO ELECTRON LTD;TOKYO ELECTRON KYUSHU KK 发明人 HIROSE OSAMU;TATEYAMA KIYOHISA
分类号 G02F1/13;B23Q3/18;C03C17/00;G02F1/1333;G03F7/26;H01L21/027;(IPC1-7):G02F1/13 主分类号 G02F1/13
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