发明名称 THE PLASTIC STYRENIC RESIN COMPOSITION HAVING ANTISTATIC ITS MANUFACTURE METHOD
摘要 The styrenic resin composition comprises; (A)5-40 wt.% a polyether ester amide polymer shown by the following structural formula consisting of (a1)amino carboxylic acid having carbon atoms of more than 6, lactam, or diamine and dicarboxylic acid' salt having carbon atoms of more than 6, (a2)a poly(alkyleneoxide)glycol, and (a3)a dicarboxylic acid having 4 to 20 carbon atoms, and has 10-95 wt.% polyether ester unit. In this formula, R1 and R2 are H, CH3 or C2H5, PA is polyamide and PE is polyalkyleneoxide, n is an integer; (B) (b1)10-60 wt.% a rubber polymer, and (b2)20-90 wt.% a graft polymer being graft-polymerized with 20-95 wt.% a monomer mixture and the copolymers of 90-40 wt.% aromatic vinyl based monomer and cyanide vinyl based monomer; (C)1-70 wt.% a copolymers polymerized by mixing 40-90 wt.% aromatic vinyl based monomer and 0-40 wt.% cyanide vinyl based monomer; and (D)2-40 wt.% a modified styrene which is prepared by melting and mixing the mixture of 80-100 wt.% said graft polymer(B) and 20-0 wt.% said copolymers(C) with 1-15 wt.% a reactive monomer having a carboxylic group against the mixture by means of a compressor.
申请公布号 KR960015809(B1) 申请公布日期 1996.11.21
申请号 KR19930016487 申请日期 1993.08.25
申请人 CHEIL IND.INC. 发明人 KIM, HYUNG-SOO;LIM, SUNG-YUL
分类号 C08L25/02;C08L33/18;C08L51/04;C08L77/00;(IPC1-7):C08L51/04 主分类号 C08L25/02
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