发明名称 CATHODIC ATOMIZATION METHOD
摘要 FIELD: mechanical and optical engineering, electronic and other branches of industry, in particular, spraying of vacuum-plasma depositions. SUBSTANCE: method involves using high-density plasma, which is formed between optically transparent screen and material to be atomized to create hollow cathode. EFFECT: increased efficiency by intensified atomization due to increased current density, increased ionization extent and formation of high-density plasma.
申请公布号 RU95102546(A) 申请公布日期 1996.11.10
申请号 RU19950102546 申请日期 1995.02.21
申请人 UFIMSKIJ GOSUDARSTVENNYJ AVIATSIONNYJ TEKHNICHESKIJ UNIVERSITET;BUDILOV V.V.;SHEKHTMAN S.R.;KIREEV R.M. 发明人 BUDILOV V.V.;SHEKHTMAN S.R.;KIREEV R.M.
分类号 C23C8/36;C23C14/34 主分类号 C23C8/36
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