| 摘要 |
PURPOSE: To remove unnecessary film by dissolution without any film exfoliation so as to eliminate scum, greasing, and film residue by using a solution containing alkali compound and nonionic interfacial active agent and specifying its pH. CONSTITUTION: Alkali developer for a radiation sensitive composition which contains alkali compound and nonionic surface active agent (specific interfacial active agent) of a cloudy point more than 50 deg.C and has pH of 9-13 is used. In this case, either of an inorganic alkali compound or an organic alkali compound can be used as an alkali compound. The specific interfacial active agent is such one having the cloudy point more than 50 deg.C, more preferable to be more than 65 deg.C, and much more preferable to be more than 70 deg.C. It is preferable to employ following substances as specific interfacial active agents; polyoxyethylene alkylether, polyoxyethelene alkylarylether, polyoxyethylene styrene phenol ether, and polyoxyethelene benzyl phenol ether. |
