发明名称 Double-beam light source apparatus, position detecting apparatus and aligning apparatus
摘要 A position detecting apparatus comprises a double-beam producing device for producing two beams different in frequency from each other, which are guided to irradiate a diffraction grating on an object to be inspected in two predetermined directions, and a detector photoelectrically detecting through an objective optical system diffracted light produced by the diffraction grating, in which the double-beam producing device comprises a light source for supplying a beam of a single wavelength or multiple wavelengths, a beam splitting device for splitting the beam from the light source into two predetermined beams, a relay optical system for converging the two split beams at a predetermined position, and a frequency difference producing device disposed at or near a converging position by the relay optical system, for producing a predetermined frequency difference between the two split beams.
申请公布号 US5569929(A) 申请公布日期 1996.10.29
申请号 US19950470889 申请日期 1995.06.06
申请人 NIKON CORPORATION 发明人 MIZUTANI, HIDEO;OTA, KAZUYA
分类号 G03F9/00;(IPC1-7):G01N21/86;G06K7/015;G01B11/00 主分类号 G03F9/00
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