| 摘要 |
<p>PURPOSE: To perform plasma treatment without adverse influence to the characteristics of the treatment. CONSTITUTION: After a sample brought into a vacuum treatment chamber is electrostatically attracted, plasma is generated. Then only an electrostatic attracting circuit is used through the plasma to attract the sample and plasma treatment is performed on the sample by applying a high-frequency bias to a sample stage so that the ions in the plasma can evenly act on the sample.</p> |
