发明名称 Article for use under high vacuum at high temperature
摘要 <p>Proposed is an article of pyrolytic boron nitride such as crucibles for use at a high temperature under an extremely high vacuum as in the molecular beam epitaxy. The article can be used in the high temperature, high vacuum process without the conventional elaborate and time-consuming degassing bake-out treatment because the article is wrapped in a wrapping film having a specified low moisture permeability immediately after a preliminary degassing treatment under specified conditions before the article is wrapped under a low-moisture atmosphere in a glove box.</p>
申请公布号 EP0712818(A3) 申请公布日期 1996.10.16
申请号 EP19950402527 申请日期 1995.11.10
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KIMURA, NOBORU;IWAI, RYOUJI;HIRATA, KAZUHITO
分类号 B01J3/00;C04B35/583;C23C14/00;C23C14/20;C23C14/24;C30B23/08;(IPC1-7):C04B35/583 主分类号 B01J3/00
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