Multilayer film forming apparatus and film forming method.

摘要

A multilayer film forming apparatus including film forming chamber 1, substrate 8 on which a multilayer film is formed, optical thickness monitoring substrate 10 which controls an optical thickness of each layer of a multilayer film, monitor exchange system 16 which exchanges optical thickness monitoring substrate 10 for each layer and multilayer film monitoring substrate 17 which is disposed under optical thickness monitoring substrate 10 to observe spectral characteristics of the multilayer film. The invention also includes light source 11 which irradiates light to optical thickness monitoring substrate 10 and to multilayer film monitoring substrate 17, an optical lens which reshapes the light radiated from light source 11, optical window 21 which lets the light into and out of film forming chamber 1, detector 14 which detects the light quantity reflected from optical thickness monitoring substrate 10 and spectral characteristics evaluation device 20 which measures spectral characteristics of the light reflected from multilayer film monitoring substrate 17. Multilayer film monitoring substrate 17 is fixed to a holding jig to prevent itself from inclining more than ten minutes against the disposed state.