| 摘要 |
PURPOSE: To efficiently produce dense aluminous refractories in a short time. CONSTITUTION: Refractories having <=5wt.% silica content and 18-30% apparent porosity obtd. by using aluminous starting material are used as base materials and Al is brought into contact with one face of each of the base materials with 0.01-0.15g/cm<2> silica glass layer in-between. They are heated at 900-1,230 deg.C in an oxygen-contg. atmosphere to allow the Al to react with and penetrate into the base materials and the objective dense aluminous refractories are produced. |
