发明名称 METHOD FOR PREPARING RESIST SOLUTION
摘要 PURPOSE: To suppress the generation of fine particles even in a long-term storage, and minimize the difference in fine particle generating quantity according to storing temperature by mixing an alkali-soluble resin, a quinonediamide group-contained compound, and an organic solvent together, and heating the resulting mixture at a temperature within a specified range. CONSTITUTION: An alkali-soluble resin, an quinonediamide group-contained compound, and an organic solvent are mixed together, and the resulting mixture is heated to a temperature of 75-85 deg.C until the absorptivity in a wavelength of 500nm is within 0.05 and 0.75. The resist solution prepared according to this method is excellent in long-term life stability, and can be suppressed in generation of fine particles even when stored for 1 month or more, the difference in fine particle generating quantity according to storing temperature is minimized, and the generation of fine particle is also minimized even when a quinonediazide group-contained compound having a high esterification degree is used. Thus, it is suitably used for the manufacture of an electronic part to which a high yield is required.
申请公布号 JPH08262698(A) 申请公布日期 1996.10.11
申请号 JP19950069945 申请日期 1995.03.28
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SHIIHARA KOJI
分类号 G03F7/004;G03F7/022;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/004
代理机构 代理人
主权项
地址