发明名称 |
VACUUM TREATING APPARATUS AND WAFER TRANSFER APPARATUS IN VACUUM TREATING CHAMBER |
摘要 |
PURPOSE: To smoothly and effectively operate a drive mechanism for vertically moving or moving a plurality of materials to be treated in a hermetically sealed chamber. CONSTITUTION: A transfer apparatus has an elevating mechanism for elevating a buffer mechanism 5 containing a plurality of LCD substrates, disposes a transfer mechanism for taking out the LCD board from the mechanism 5 by a transfer arm and transferring it into a treating chamber in a load locking chamber, and provides a halogen lamp 39 for heating the ball screw shaft 22 and the guide shaft 25 of the elevating mechanism disposed in the locking chamber to remove the adhering matters on the surfaces of the shafts 22 and 25. |
申请公布号 |
JPH08264616(A) |
申请公布日期 |
1996.10.11 |
申请号 |
JP19950067368 |
申请日期 |
1995.03.27 |
申请人 |
TOKYO ELECTRON LTD;TOKYO ELECTRON YAMANASHI KK |
发明人 |
HIROKI TSUTOMU |
分类号 |
H01L21/302;H01L21/3065;H01L21/677;H01L21/68;(IPC1-7):H01L21/68;H01L21/306 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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