发明名称 SURFACE TREATMENT APPARATUS
摘要 <p>A surface treatment apparatus (30) for performing surface treatment of a work (39) by means of plasma generated under a pressure close to the atmospheric pressure, in which apparatus a porous dielectric substance (37) is supported on an undersurface of a porous electrode (32) with its outer peripheral edge supported by a support member (45). The support member (45) is formed with an upwardly inclined surface, and the dielectric substance (37) is formed with a downwardly inclined surface, so that the dielectric substance (37) can be supported by the support member (45) while permitted to undergo thermal expansion deformation. Also, discharge gas can be uniformly supplied to a discharge area (51) through both the porous electrode (32) and the porous dielectric substance (37). A multiplicity of flow rate regulatable gas exhaust ports (41) are arranged around the discharge area (51). The gas is uniformly exhausted around the discharge area (51). In particular, the gas can be uniformly exhausted around the discharge area (51) even if a gap between the dielectric substance (37) and the work (39) is not uniform from place to place depending upon a mounting accuracy.</p>
申请公布号 WO1996031997(P1) 申请公布日期 1996.10.10
申请号 JP1996000935 申请日期 1996.04.05
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