Adsorbierter monomolekularer Film und dessen Herstellung
摘要
<p>The invention seeks to provide a method of forming a monomolecular film of fluorine-containing molecules on a substrate surface such that the film has an uniform thickness with minimal surface irregularities and is substantially pin hole free. The invention also provides for a substrate obtained by using the same method which has excellent water-and oil-repelling, anti-fogging, and anti-contaminating properties. The monomolecular film is formed on the substrate surface either directly or via a given protective film. The monomolecular film coating is characterized by a plurality of different chlorosilane-based surface active materials which are different in molecular length have a fluorine group. The surface irregularities of the film are generally confined to the molecular level. <IMAGE></p>
申请公布号
DE69120226(T2)
申请公布日期
1996.10.10
申请号
DE1991620226T
申请日期
1991.12.06
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., KADOMA, OSAKA, JP