发明名称 FINE PATTERN FORMING APPARATUS AND CHARACTERISTICS MEASURING APPARATUS
摘要 PURPOSE: To obtain a fine pattern forming apparatus for forming a fine structure on the order of nm. CONSTITUTION: The fine pattern forming apparatus comprises a body to be processed connected with one electrode of a DC power supply circuit with an electron-sensitive resist layer 5 being provided on the surface thereof, and a transfer pattern plate 1 having a protruding pattern of conductive material, or covered with a conductive material, connected with the other electrode of the DC power supply circuit and disposed closely or tightly to the electron- sensitive resist layer 5 on the body to be processed. The transfer pattern plate 1 is fixed to the probe part of a scanning probe unit and the electron-sensitive resist layer 5 is exposed selectively by controlling the operation of the probe part.
申请公布号 JPH08248064(A) 申请公布日期 1996.09.27
申请号 JP19950055949 申请日期 1995.03.15
申请人 TOSHIBA CORP 发明人 SAWA MINORU;CHO TOSHI;SAKAI TADASHI;KATO RIICHI;TANAMOTO TETSUSHI
分类号 G01R1/067;G01Q60/10;G01Q80/00;G01R1/073;H01L21/027;H01L21/306;(IPC1-7):G01R1/067 主分类号 G01R1/067
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