发明名称 |
FINE PATTERN FORMING APPARATUS AND CHARACTERISTICS MEASURING APPARATUS |
摘要 |
PURPOSE: To obtain a fine pattern forming apparatus for forming a fine structure on the order of nm. CONSTITUTION: The fine pattern forming apparatus comprises a body to be processed connected with one electrode of a DC power supply circuit with an electron-sensitive resist layer 5 being provided on the surface thereof, and a transfer pattern plate 1 having a protruding pattern of conductive material, or covered with a conductive material, connected with the other electrode of the DC power supply circuit and disposed closely or tightly to the electron- sensitive resist layer 5 on the body to be processed. The transfer pattern plate 1 is fixed to the probe part of a scanning probe unit and the electron-sensitive resist layer 5 is exposed selectively by controlling the operation of the probe part.
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申请公布号 |
JPH08248064(A) |
申请公布日期 |
1996.09.27 |
申请号 |
JP19950055949 |
申请日期 |
1995.03.15 |
申请人 |
TOSHIBA CORP |
发明人 |
SAWA MINORU;CHO TOSHI;SAKAI TADASHI;KATO RIICHI;TANAMOTO TETSUSHI |
分类号 |
G01R1/067;G01Q60/10;G01Q80/00;G01R1/073;H01L21/027;H01L21/306;(IPC1-7):G01R1/067 |
主分类号 |
G01R1/067 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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