发明名称 Thermal infrared sensor and a method of manufacturing the same
摘要 Object of the present invention is to provide a thermal type infrared sensor and a method of manufacturing the same that degree of freedom of a structure is high and cost is low. An infrared ray detecting portion and a support leg are formed above a flat plate-shape void formed inside of a semiconductor substrate, and a processing circuit section of a signal from a detecting portion is fabricated on the semiconductor substrate. Because the structure of the processing circuit section is not influenced by a substrate structure, characteristics is improved. Furthermore, the structure is simplified, and it is possible to reduce a manufacturing cost.
申请公布号 US2001025926(A1) 申请公布日期 2001.10.04
申请号 US20010819898 申请日期 2001.03.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MASHIO NAOYA;IIDA YOSHINORI;SHIGENAKA KEITARO
分类号 G01J1/02;G01J5/12;G01J5/20;G01J5/48;H01L21/00;H01L27/14;H01L27/146;H01L29/861;H01L31/02;H01L31/09;(IPC1-7):H01L27/14 主分类号 G01J1/02
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