| 摘要 |
<p>Interferometry system, in which several interference patterns are generated simultaneously from an incident light beam which is formed by interference of at least a first light beam reflected by an object to be examined and a second light beam, which interference patterns mutually differ in phase, wherein the system comprises transformation means which transform the incident light beam in such a way that the transformed light beam comprises three or more partial beams, which run essentially in the same direction, there being a phase difference between at least two of the partial beams, and wherein the system comprises splitting means which split the transformed light beam into two or more spatially separate further partial beams.</p> |
