发明名称 POROUS SEMICONDUCTOR MATERIAL
摘要 <p>PCT No. PCT/GB94/02531 Sec. 371 Date Jun. 5, 1996 Sec. 102(e) Date Jun. 5, 1996 PCT Filed Nov. 17, 1994 PCT Pub. No. WO95/16280 PCT Pub. Date Jun. 15, 1995Porous semiconductor material in the form of at least partly crystalline silicon is produced with a porosity in excess of 90% determined gravimetrically, and voids, crazing and peeling are substantially not observable by scanning electron microscopy at a magnification of 7,000. The porous silicon is dried by supercritical drying. The silicon material has good luminescence properties together with good morphology and crystallinity.</p>
申请公布号 EP0733269(A1) 申请公布日期 1996.09.25
申请号 EP19950900872 申请日期 1994.11.17
申请人 THE SECRETARY OF STATE FOR DEFENCE 发明人 CANHAM, LEIGH, TREVOR
分类号 C04B38/00;C25F3/12;H01L21/3063;H01L29/16;H01L33/34;(IPC1-7):H01L33/00 主分类号 C04B38/00
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