| 摘要 |
<p>A method of writing a pattern or part of a pattern on a substrate by means of an electron beam comprises deflecting the beam to scan, in succession, sub-fields (1...27) of grid format within a field containing the pattern or pattern part. To reduce scanning delay between both vertically and horizontally adjacent sub-fields in the centre of the pattern, where finer pattern detail susceptible to time-related drift error may be located, the deflection of the beam is controlled to cause the pattern or pattern part to be written by progression through the sub-fields along a spiral path, the origin of which coincides with the location of the finer pattern detail.</p> |
