发明名称 |
Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate |
摘要 |
A radiation sensitive resin composition which comprises (A) a copolymer represented by the following general formula and (B) a radiation sensitive acid generator and, if necessary, (C) an alkali-soluble resin: <IMAGE> wherein R represents a hydrogen atom or a methyl group and m and n are integers representing the numbers of the respective recurring units and satisfying the relations 0.1>/=m/(m+n)<0.6 and 0.4<n/(m+n)</=0.9. Said radiation sensitive resin composition is excellent in resolution and pattern profile and also excellent in sensitivity and developability and is useful as a chemically amplified resist good in contrast and heat resistance.
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申请公布号 |
US5556734(A) |
申请公布日期 |
1996.09.17 |
申请号 |
US19940363269 |
申请日期 |
1994.12.23 |
申请人 |
JAPAN SYNTHETIC RUBBER CO., LTD. |
发明人 |
YAMACHIKA, MIKIO;KOBAYASHI, EIICHI;OTA, TOSHIYUKI;TSUJI, AKIRA |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03C1/73 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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