| 摘要 |
PURPOSE: To eliminate a detection error due to a rotation error between a light beam and a detection mark of a diffraction-light-detection-type alignment sensor by reducing the weight of a wafer stage to increase rigidity. CONSTITUTION: A reticle is rotated by an average (θLSAX+θLSAY)/2 of a rotation angle of a light beam from an alignment sensor to a coordinate system (X, Y) of a wafer stage (steps 101, 102). When wafers are mounted on a wafer holder in order, a wafer is rotated by an average rotation errorθT which is an average in rotation error of previous wafers (step 121), and a remaining slight rotation errorΔθ, is corrected by rotation of the reticle. |
