发明名称 |
Optical system for excimer laser |
摘要 |
<p>The optical system provides a sharp illumination line (B), with long and short axes, from the laser beam (12) provided by a high power laser source (10), using an anamorphotic arrangement of imaging and homogenising optical elements (16,18,20,22,24,26,30,32). The laser beam is separately imaged and homogenised for the long and short axes, the imaging and homogenising for the short axis employing a uniformly illuminated gap (26), imaged onto the illumination plane via a reducing lens (32).</p> |
申请公布号 |
DE19520187(C1) |
申请公布日期 |
1996.09.12 |
申请号 |
DE1995120187 |
申请日期 |
1995.06.01 |
申请人 |
MICROLAS LASERSYSTEM GMBH, 37079 GOETTINGEN, DE |
发明人 |
BURGHARDT, BERTHOLD, DR., 37136 WAAKE, DE;KAHLERT, HANS-JUERGEN, DR., 37077 GOETTINGEN, DE |
分类号 |
G02B13/22;B23K26/066;B23K26/073;G02B27/09;(IPC1-7):G02B27/09;B23K26/06 |
主分类号 |
G02B13/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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