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发明名称
Method of manufacturing a semiconductor device provided with an isolation region.
摘要
申请公布号
EP0615288(A3)
申请公布日期
1996.09.11
申请号
EP19940103787
申请日期
1994.03.11
申请人
KABUSHIKI KAISHA TOSHIBA
发明人
OYAMATSU, HISATO
分类号
H01L21/265;H01L21/76;H01L21/762;H01L29/10;(IPC1-7):H01L21/76
主分类号
H01L21/265
代理机构
代理人
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地址
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