DEEP PATTERN MICRO-LITHOGRAPHY

摘要

A process of lithographically forming microstructures comprises irradiating a workpiece having a radiation sensitive resist with radiation and either simultaneously or sequentially developing the exposed resist whereby new resist revealed by the development of exposed resist is also exposed and developed. In this way deep structures having dimensions between tens of microns and millimetres may be formed without the need for hard x-rays as the incident radiation. Where hard x-rays are employed as the incident radiation the process enables the formation of deep structures much more quickly than using conventional processes.