| 摘要 |
In the silicon plate is etched a recess (7) down to the baseplate and tracks are etched on both sides of the recess. The tracks are straight and have a constant cross-section over their length, which cross section is suited for the track to act as a guide for an optical fibre placed in the track. One track on one side of the recess is accurately aligned with one on the other side of the recess. Both tracks have a like cross-section. The tracks lie in a (110) direction in the silicon, whilst the silicon plate surface is located in a (100) direction. The etched of the tracks and/or the recess is carried out with an anisotrope silicon etch. |
