| 摘要 |
<p>An ion beam accelerator and an ion implantation system (63) including a plurality of spaced apart electrodes (14, 8, 16), including at least one active electrode (8), and a pair of oppositely wound coils (2, 4) disposed within the shield (5), the coils (2, 4) being in parallel, having respective terminating ends electrically coupled together in pairs, the end regions of the two coils (2, 4) being positioned relative to each other for flow of flux between the coils so that, when the coils (2, 4) are energized, magnetic fields (26) produced by the coils (2, 4) are reinforced within the coils (2, 4) and are reduced outside of the coils (2, 4); wherein, when the coils (2, 4) are energized, the coils (2, 4) produce at the active electrode (8) a time-varying oscillatory electric potential of a selected resonant frequency to establish between electrodes (14, 8, 16) a time-varying oscillatory electric field in the vicinity of the beam path (28) to accelerate ions. A general purpose resonant system based on the above-mentioned oppositely wound coil structure is also disclosed.</p> |
