发明名称 |
Magnetic filter apparatus and method for generating cold plasma in semicoductor processing |
摘要 |
Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.
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申请公布号 |
US5545257(A) |
申请公布日期 |
1996.08.13 |
申请号 |
US19940258958 |
申请日期 |
1994.06.13 |
申请人 |
ELECTRO-GRAPH, INC. |
发明人 |
VELLA, MICHAEL C. |
分类号 |
H01J37/02;(IPC1-7):C23C16/00 |
主分类号 |
H01J37/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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