| 摘要 |
PURPOSE: To provide a positive photosensitive composition capable of easily and suitably preventing acid diffusion and deactivation owing to time lapse from exposure to heat treatment and improving dissolution hindering action and developability and stabilizing good profiles and high resolution. CONSTITUTION: The positive photosensitive composition contains an alkali- soluble resin, and a compound to be allowed to generate an acid, and a block copolymer of a polymer segment (A) comprising an acid decomposable disolution-hindering compound having an acid-decomposable group and increasable in solubility in an alkaline developing solution by action of the acid and having a molecular weight of <=3000, and a polymer component containing F atoms and/or Si atoms in an amount of >=50mol%, and another polymer segment (B) containing these components of (A) in an amount of <=20wt.% or not. |
