| 摘要 |
PURPOSE: To provide a radiation sensitive resin composition especially superior in resolution and pattern form and also superior in sensitivity and developability, and yet good in contrast and heat resistance and the like, and useful as a chemically amplifiable resist. CONSTITUTION: The radiation sensitive resin composition contains a polymer (A) having repeating units each represented by the formula (in which R<1> is a substituted methyl or ethyl group, a silyl or germyl or alkoxycarbonyl group; R<2> is a -OR<3> or -NR<4> R<5> group; and each of R<3> -R<5> is, independently, an H atom or a straight or branched alkyl, aralkyl, aryl, substituted methyl, substituted ethyl, silyl, germyl, or alkoxycarbonyl group), and at least one radiation sensitive acid generator selected from imidosulfonate derivatives. |
