| 摘要 |
Described are a method for generating a laser beam and a laser device for the method. In a first step gas is ionised by means of X-rays. In a second step the electron density is increased by means of a pre-discharge. In a third step the main discharge takes place. Between the second and third steps, am electron redistribution occurs. According to the invention, the electron redistribution rate and/or the time delay between the pre-discharge and the main discharge are adjustable and controllable in relation to each other, for achieving a particular desired beam profile, such as a uniform profile. Because that delay is preferably set by varying one or more process parameters, an important advantage is achieved in that it is possible with one and the same laser device to modify the beam profile in a simple and flexible manner even during the operation of the laser device.
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