发明名称 Vacuum chamber with vertical handling system and non-return valve
摘要 The component e.g. a silicon wafer (W), is supported at the end of a rod (8) within a vacuum chamber (1) and can be moved vertically. Located on the underside of the housing is a support system for the rod and also a vertical transfer actuator (30). The support has a tube (2) with a flange (5) and end cap (4) that maintains the sealed vacuum condition. Mounted on the rod is a magnetic element (12) and a pair of permanent magnets (16,17). Surrounding the tube is an electromagnet (11) and permanent magnets (14,15). The field generated provides a radial bearing support for the rod. Also coupled to the rod is a non return valve for the vacuum chamber.
申请公布号 DE19601541(A1) 申请公布日期 1996.08.01
申请号 DE19961001541 申请日期 1996.01.17
申请人 SEIKO SEIKI K.K., NARASHINO, CHIBA, JP 发明人 KOYANO, SHINJI, NARASHINO, CHIBA, JP;MATSUZAKI, RYUICHI, NARASHINO, CHIBA, JP
分类号 B65G49/07;F16K51/02;H01L21/00;H01L21/687;(IPC1-7):B65G54/02;H01F7/121;F16K31/06 主分类号 B65G49/07
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