发明名称 Immersion-type apparatus for processing substrates
摘要 A holding rod is disposed in a processing bath close to the bottom of the processing bath. The holding rod is located in a bottom center portion of the processing bath between two processing fluid supply pipes. Since the holding rod serves as diaphragm means, a processing fluid from outlet holes rushing toward the bottom center portion of the processing bath along the bottom of the processing bath hits the holding rod, changes its direction upward and starts uniformly circulating in the processing bath.
申请公布号 US5540247(A) 申请公布日期 1996.07.30
申请号 US19940349446 申请日期 1994.12.05
申请人 DAINIPPON SCREEN MFG. CO., LTD. 发明人 KAWATANI, MASAFUMI;TERASHIMA, KOUZOU;SHIRAKAWA, HAZIME
分类号 B08B3/10;H01L21/00;H01L21/304;(IPC1-7):B08B3/04 主分类号 B08B3/10
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